Journal article
Opportunities and pitfalls in patterned self-catalyzed GaAs nanowire growth on silicon
Abstract
Periodic arrays of self-catalyzed GaAs nanowires (NWs) were grown on Si substrates by gas source molecular beam epitaxy (GS-MBE) using patterned oxide templates. The various challenges of the patterning process that result in undesired outcomes are described, such as pattern transfer by wet/dry etching, oxide thickness variations, and native oxide re-growth. Transmission electron microscopy (TEM) results are used to illustrate each case. In …
Authors
Gibson SJ; Boulanger JP; LaPierre RR
Journal
Semiconductor Science and Technology, Vol. 28, No. 10,
Publisher
IOP Publishing
Publication Date
October 1, 2013
DOI
10.1088/0268-1242/28/10/105025
ISSN
0268-1242