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Opportunities and pitfalls in patterned...
Journal article

Opportunities and pitfalls in patterned self-catalyzed GaAs nanowire growth on silicon

Abstract

Periodic arrays of self-catalyzed GaAs nanowires (NWs) were grown on Si substrates by gas source molecular beam epitaxy (GS-MBE) using patterned oxide templates. The various challenges of the patterning process that result in undesired outcomes are described, such as pattern transfer by wet/dry etching, oxide thickness variations, and native oxide re-growth. Transmission electron microscopy (TEM) results are used to illustrate each case. In …

Authors

Gibson SJ; Boulanger JP; LaPierre RR

Journal

Semiconductor Science and Technology, Vol. 28, No. 10,

Publisher

IOP Publishing

Publication Date

October 1, 2013

DOI

10.1088/0268-1242/28/10/105025

ISSN

0268-1242