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A New Non-PRM Bumping Process by Electroplating on...
Journal article

A New Non-PRM Bumping Process by Electroplating on Si Die for Three Dimensional Packaging

Abstract

A new bumping process on a Si die by electroplating without a photo-resist-mold (PRM) was assessed for the three dimensional (3D) stacking of Si dice. In this process, solder bumps were deposited selectively onto the surface of a Cu plugged-through silicon-via (TSV) in a Si die. Since lithography related processes to make a PRM for solder bumping were omitted, it can reduce the production time and cost for bumping. The substrate was a Si wafer, …

Authors

Jun J; Kim I; Mayer M; Zhou YN; Jung S; Jung J

Journal

Materials Transactions, Vol. 51, No. 10,

Publisher

Japan Institute of Metals

Publication Date

2010

DOI

10.2320/matertrans.m2009314

ISSN

0916-1821