Enhanced Block Copolymer Lithography Using Sequential Infiltration Synthesis

Block copolymer lithography is a promising approach to massively parallel, high-resolution, and low-cost patterning, but the inherently low etch resistance of polymers has limited its applicability to date. In this work, this challenge is overcome by dramatically increasing the plasma etch contrast of polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) using spatially localized sequential infiltration synthesis (SIS) of alumina. The PMMA …