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Low-frequency noise in a thin active layer α-Si:H...
Journal article

Low-frequency noise in a thin active layer α-Si:H thin-film transistors

Abstract

Low-frequency noise of hydrogenated-amorphous-silicon (α-Si:H) thin-film transistors (TFTs) with a thin active layer and an inverted staggered device structure operating in the conducting mode has been investigated. Pure 1/f-noise spectra were observed. The results show that the physical location of the noise in α-Si:H TFTs is different from that in crystalline metal–oxide–semiconductor field-effect transistors. The noise contributions from the …

Authors

Chen XY; Deen MJ; van Rheenen AD; Peng CX; Nathan A

Journal

Journal of Applied Physics, Vol. 85, No. 11, pp. 7952–7957

Publisher

AIP Publishing

Publication Date

June 1, 1999

DOI

10.1063/1.370614

ISSN

0021-8979