Experts has a new look! Let us know what you think of the updates.

Provide feedback
Home
Scholarly Works
Effect of Forward and Reverse Substrate Biasing on...
Journal article

Effect of Forward and Reverse Substrate Biasing on Low-Frequency Noise in Silicon PMOSFETs

Abstract

The forward body biasing improves the low-frequency noise performance of p-channel metal-oxide semiconductor (PMOS) transistors by about 8 dB/V. Therefore, for analog design, forward body biasing may be preferred if noise is a concern. This is in agreement with the improvement of other MOSFET parameters such as the decrease of the threshold voltage ($V_{T}$) or the increase of unity current-gain frequency ($f_{T}$) on forward substrate- (or …

Authors

Deen MJ; Marinov O

Journal

IEEE Transactions on Electron Devices, Vol. 49, No. 3,

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Publication Date

March 1, 2002

DOI

10.1109/16.987110

ISSN

0018-9383

Labels