Constant-resistance deep-level transient spectroscopy in submicron metal-oxide-semiconductor field-effect transistors

This article describes a new variation of a deep-level transient spectroscopy (DLTS) technique convenient for the measurement of submicron field-effect transistors where standard capacitance DLTS cannot be used. Constant-resistance (CR) DLTS is similar to the conductance DLTS, but it is more sensitive and it does not require simultaneous measurement of the transconductance gm or surface mobility μ for calculation of the trap concentrations. In addition, the DLTS signal is largely independent of the transistor size, thus allowing measurements of very small-size transistors. The proposed technique is not restricted to metal-oxide-semiconductor field-effect transistors, but can be used also to study other field-effect transistors.