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The role of vicinal silicon surfaces in the...
Journal article

The role of vicinal silicon surfaces in the formation of epitaxial twins during the growth of III-V thin films

Abstract

We examine the role of vicinal surface steps in the formation and propagation of twins during the growth of epitaxial III-V thin films (GaAs, InP, GaSb, AlSb) on silicon substrates. This is achieved through the combined use of two-dimensional X-ray diffraction and conventional transmission electron microscopy techniques, which allow for both a macro and nano/micro characterization of the material systems. Observed is a systematic suppression of …

Authors

Devenyi GA; Woo SY; Ghanad-Tavakoli S; Hughes RA; Kleiman RN; Botton GA; Preston JS

Journal

Journal of Applied Physics, Vol. 110, No. 12,

Publisher

AIP Publishing

Publication Date

December 15, 2011

DOI

10.1063/1.3671022

ISSN

0021-8979