Journal article
The role of vicinal silicon surfaces in the formation of epitaxial twins during the growth of III-V thin films
Abstract
We examine the role of vicinal surface steps in the formation and propagation of twins during the growth of epitaxial III-V thin films (GaAs, InP, GaSb, AlSb) on silicon substrates. This is achieved through the combined use of two-dimensional X-ray diffraction and conventional transmission electron microscopy techniques, which allow for both a macro and nano/micro characterization of the material systems. Observed is a systematic suppression of …
Authors
Devenyi GA; Woo SY; Ghanad-Tavakoli S; Hughes RA; Kleiman RN; Botton GA; Preston JS
Journal
Journal of Applied Physics, Vol. 110, No. 12,
Publisher
AIP Publishing
Publication Date
December 15, 2011
DOI
10.1063/1.3671022
ISSN
0021-8979