The Dependence of Photoetching n ‐ InP on Surface Preparation and Electrolyte Metal Ion Impurities

Photochemical etching of n‐InP using an Ar+ laser and dilute phosphoric acid was studied as a function of surface preparation. The samples were prepared by chemical polishing with a 1% bromine‐methanol solution and mechanical polishing with alumina powders. The surfaces were characterized using electron microscopy, photoluminescence, and mechanical stylus profiling. Photoetch rate was found to increase with surface roughness. The variation of …