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Growth of nanoporous silicon dioxide thin films...
Journal article

Growth of nanoporous silicon dioxide thin films using porous alumina substrates

Abstract

In this paper, we report a cost-effective and highly reproducible method for the deposition of porous SiO2 thin films by using commercially available porous alumina membranes and radio-frequency magnetron sputtering method. Due to the porous surface of the substrate and its narrow and long channels, the SiO2 thin films partially cover the pores of the alumina membranes and self-organized porous network structures are formed. The pore size …

Authors

Chen F; Kitai AH

Journal

Thin Solid Films, Vol. 517, No. 2, pp. 622–625

Publisher

Elsevier

Publication Date

November 2008

DOI

10.1016/j.tsf.2008.07.009

ISSN

0040-6090