Journal article
Growth of nanoporous silicon dioxide thin films using porous alumina substrates
Abstract
In this paper, we report a cost-effective and highly reproducible method for the deposition of porous SiO2 thin films by using commercially available porous alumina membranes and radio-frequency magnetron sputtering method. Due to the porous surface of the substrate and its narrow and long channels, the SiO2 thin films partially cover the pores of the alumina membranes and self-organized porous network structures are formed. The pore size …
Authors
Chen F; Kitai AH
Journal
Thin Solid Films, Vol. 517, No. 2, pp. 622–625
Publisher
Elsevier
Publication Date
November 2008
DOI
10.1016/j.tsf.2008.07.009
ISSN
0040-6090