Implantation of Ni thin films and single crystals with Ag ions

40–130 keV Ag + ions have been implanted at 46 K and 300 K into Ni films (25–38 nm thick) deposited on NaCl and Ni single crystals (100) and (110) in the dose range 10 11 to 4 × 10 16 cm −2. In-situ backscattering measurements and channeling (in the single crystals) have been carried out. The thin films were also analysed using TEM, STEM and EDS. For the single crystal samples it is found that 80% of the Ag is substitutional at the Ag …