Etching of InP surface oxide with atomic hydrogen produced by electron cyclotron resonance

The plasma output of an electron cyclotron resonance source operating with hydrogen has been characterized using optical emission spectroscopy to observe neutral excited atomic hydrogen H* and a Langmuir probe to observe H+ as a function of currents to the two electromagnets producing the magnetic field. The rate at which the hydrogen plasma etches the surface oxide on InP substrates has been measured as a function of substrate temperature over …