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Dependence of carrier lifetime and resistivity on...
Journal article

Dependence of carrier lifetime and resistivity on annealing in InP grown by He-plasma-assisted molecular beam epitaxy

Abstract

We have experimentally investigated the carrier lifetime and resistivity versus anneal temperature in InP films grown by He-plasma-assisted molecular beam epitaxy. This material is shown to exhibit picosecond carrier lifetime with high resistivity even after anneal at temperatures up to 700 °C.

Authors

Kang JU; Frankel MY; Esman RD; Thompson DA; Robinson BJ

Journal

Journal of Applied Physics, Vol. 83, No. 6, pp. 3423–3425

Publisher

AIP Publishing

Publication Date

March 15, 1998

DOI

10.1063/1.367110

ISSN

0021-8979