Sputtering of silver by heavy atomic and molecular ion bombardment

The sputtering yield of Ag bombarded with various 10–100 keV monatomic and polyatomic ions has been measured. It is found that the energy dependence of the sputtering yield follows the energy dependence of the total surface deposited energy into atomic processes (obtained by a Monte Carlo code). The measured data show an apparent “universal” (independence with ion mass) relationship with the surface deposited energy. A critical surface deposited energy is obtained, below which linear behaviour and agreement with cascade theory is observed, and above which the sputter yield (surface deposited energy) [3]. Results are also given for the measured sputtering yield vs incident beam angle. These data are discussed in the context of the normal incident data.