Journal article
Effects of Electron Cyclotron Resonance Power and Cavity Dimensions in Plasma Etching of III–V Compounds
Abstract
A multipolar, tuned cavity, electron cyclotron resonance (ECR) source is applied to hydrocarbon plasma etching of InP . Various ECR modes are created at different cavity dimensions and etch properties have been studied as a function of this parameter and ECR power. These etch characteristics are correlated with in situ optical emission spectroscopy, Langmuir probe, and secondary ion mass spectrometry diagnostics. Relative concentrations of …
Authors
Melville DL; Thompson DA; Simmons JG
Journal
Journal of The Electrochemical Society, Vol. 142, No. 8, pp. 2762–2769
Publisher
The Electrochemical Society
Publication Date
August 1, 1995
DOI
10.1149/1.2050089
ISSN
0013-4651