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Effects of Electron Cyclotron Resonance Power and...
Journal article

Effects of Electron Cyclotron Resonance Power and Cavity Dimensions in Plasma Etching of III–V Compounds

Abstract

A multipolar, tuned cavity, electron cyclotron resonance (ECR) source is applied to hydrocarbon plasma etching of InP . Various ECR modes are created at different cavity dimensions and etch properties have been studied as a function of this parameter and ECR power. These etch characteristics are correlated with in situ optical emission spectroscopy, Langmuir probe, and secondary ion mass spectrometry diagnostics. Relative concentrations of …

Authors

Melville DL; Thompson DA; Simmons JG

Journal

Journal of The Electrochemical Society, Vol. 142, No. 8, pp. 2762–2769

Publisher

The Electrochemical Society

Publication Date

August 1, 1995

DOI

10.1149/1.2050089

ISSN

0013-4651