Journal article
Comparison of Quantum Well Interdiffusion on Group III, Group V, and Combined Groups III and V Sublattices in GaAs-Based Structures
Abstract
An analytical electron microscope was used for direct measurement of the concentration profiles of $\hbox{In}_{1 - x} \hbox{Ga}_x \hbox{As}_y \hbox{P}_{1 - y}$ quantum wells (QWs) and barriers grown by molecular beam epitaxy on GaAs substrates. The well and barrier layers had compositional differences on the group III (In/Ga) sublattice only, the group V (As/P) sublattice only, and on both sublattices. These were annealed over a range of …
Authors
Hulko O; Thompson DA; Simmons JG
Journal
IEEE Journal of Selected Topics in Quantum Electronics, Vol. 14, No. 4, pp. 1104–1112
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Publication Date
January 1, 2008
DOI
10.1109/jstqe.2008.920041
ISSN
1077-260X