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Comparison of Quantum Well Interdiffusion on Group...
Journal article

Comparison of Quantum Well Interdiffusion on Group III, Group V, and Combined Groups III and V Sublattices in GaAs-Based Structures

Abstract

An analytical electron microscope was used for direct measurement of the concentration profiles of $\hbox{In}_{1 - x} \hbox{Ga}_x \hbox{As}_y \hbox{P}_{1 - y}$ quantum wells (QWs) and barriers grown by molecular beam epitaxy on GaAs substrates. The well and barrier layers had compositional differences on the group III (In/Ga) sublattice only, the group V (As/P) sublattice only, and on both sublattices. These were annealed over a range of …

Authors

Hulko O; Thompson DA; Simmons JG

Journal

IEEE Journal of Selected Topics in Quantum Electronics, Vol. 14, No. 4, pp. 1104–1112

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Publication Date

January 1, 2008

DOI

10.1109/jstqe.2008.920041

ISSN

1077-260X