Transmission electron microscopy investigation of the atomic structure of interfaces in nanoscale Cu–Nb multilayers

Multilayers of Cu–Nb have been grown on a Nb seed layer on a Si (100) substrate using a magnetron sputtering technique. The bilayer period (Λ) was varied from 10 to 2.4 nm. Cross-sectional transmission electron microscopy (XTEM) and high-resolution TEM (HRTEM) were used to study the detailed structure as a function of the bilayer period. Although the majority of the structures conformed to a Kurdjumov–Sachs (K–S) orientation relationship between the Cu and Nb layers, the structures exhibit considerable spatial variation. In some local regions, a Nishiyama–Wasserman (N–W) orientation relationship was found. In addition, considerable distortions were observed in both the Cu and Nb regions close to the interface. Using both HRTEM imaging and fast Fourier transform (FFT) of HRTEM images, early stage of the fcc to bcc transition in Cu was detected. The results suggest that, in multilayer structures, the detailed structure of the interface and large local distortions may play an important role in interface-controlled plasticity.