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Microstructure, indentation and work hardening of...
Journal article

Microstructure, indentation and work hardening of Cu/Ag multilayers

Abstract

Instrumented indentation and tensile tests were performed on free standing Cu/Ag multilayer thin films with layer thicknesses in the range 0.85–900 nm. The effect of layer thickness can be described by a Hall–Petch relationship. The work-hardening rate in the tensile test depends on layer thickness, which indicates that the interfaces create storage sites for dislocations and follows an inverse power law.

Authors

Verdier§ M; Huang¶ H; Spaepen F; Embury JD; Kung H

Journal

The Philosophical Magazine A Journal of Theoretical Experimental and Applied Physics, Vol. 86, No. 32, pp. 5009–5016

Publisher

Taylor & Francis

Publication Date

November 11, 2006

DOI

10.1080/14786430600746440

ISSN

1478-6435

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