Journal article
Simultaneous analysis of multiple extended x-ray-absorption fine-structure spectra: Application to studies of buried Ge-Si interfaces
Abstract
Ge K-edge extended x-ray-absorption fine-structure (EXAFS) spectra of a series of strained-layer [(Si)m/(Ge)n]p superlattices grown by molecular-beam epitaxy on the 〈100〉 face of single-crystal Si have provided a determination of the degree of intermixing and the extent of relaxation as a function of the thickness of the Ge layer. The results are obtained with use of constrained simultaneous nonlinear least-squares curve fits to multiple data …
Authors
Aebi P; Tyliszczak T; Hitchcock AP; Baines KM; Sham TK; Jackman TE; Baribeau J-M; Lockwood DJ
Journal
Physical Review B, Vol. 45, No. 23, pp. 13579–13590
Publisher
American Physical Society (APS)
Publication Date
June 15, 1992
DOI
10.1103/physrevb.45.13579
ISSN
2469-9950