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A Facile Method of Forming Nanoscale Patterns on...
Journal article

A Facile Method of Forming Nanoscale Patterns on Poly(ethylene glycol)-Based Surfaces by Self-Assembly of Randomly Grafted Block Copolymer Brushes

Abstract

Poly(oligo(ethylene glycol) methacrylate) (POEGMA) block poly(methyl methacrylate) (PMMA) brushes were synthesized on the silicon wafer surfaces by the surface-initiated atom transfer radical polymerization (ATRP) method. Atomic force microscopy, ellipsometry, and water contact angle methods were employed to study the surface morphology and stimulus-response behavior. It was found that simple solvent treatments could induce phase segregation of …

Authors

Gao X; Feng W; Zhu S; Sheardown H; Brash JL

Journal

Langmuir, Vol. 24, No. 15, pp. 8303–8308

Publisher

American Chemical Society (ACS)

Publication Date

August 1, 2008

DOI

10.1021/la800729c

ISSN

0743-7463