Journal article
Sequential Self-Assembly of Polystyrene-block-Polydimethylsiloxane for 3D Nanopatterning via Solvent Annealing
Abstract
This study aims to develop a strategy for the fabrication of multilayer nanopatterns through sequential self-assembly of lamella-forming polystyrene-block-polydimethylsiloxane (PS-b-PDMS) block copolymer (BCP) from solvent annealing. By simply tuning the solvent selectivity, a variety of self-assembled BCP thin-film morphologies, including hexagonal perforated lamellae (HPL), parallel cylinders, and spheres, can be obtained from …
Authors
Shastry T; Xie J; Tung C-H; Lynn TY; Panda AS; Shi A-C; Ho R-M
Journal
ACS Applied Materials & Interfaces, Vol. 16, No. 30, pp. 40263–40274
Publisher
American Chemical Society (ACS)
Publication Date
July 31, 2024
DOI
10.1021/acsami.4c08813
ISSN
1944-8244