Optical and Structural Properties of Europium-Doped Silicon Oxide Fabricated Using Integrated Sputtering and Chemical Vapour Deposition

Europium (Eu) doped silicon oxide (SiOx) thin films containing Eu concentrations of 0.2 to 6.4 at% were fabricated using a hybrid deposition system combining a magnetron sputtering gun serving as the doping source with electron cyclotron resonance plasma enhanced chemical vapour deposition (ECR-PECVD). The influence of annealing conditions on the structural and luminescence properties was thoroughly studied. The optical properties of the films …