Atomic scale study of InP etching by Cl2-Ar ICP plasma discharge Journal Articles
- Overview
- Research
- Identity
- Additional Document Info
- View All
Overview
status
publication date
- March 2011
has subject area
- 01 Mathematical Sciences (FoR)
- 02 Physical Sciences (FoR)
- Applied Physics (Science Metrix)
published in
- EPJ Applied Physics Journal