A Comparative Study of a:SiCN:H Thin Films Fabricated with Acetylene and Methane

Abstract

In this paper we present a comparative study of the properties of amorphous hydrogenated silicon carbonitride (SiCN:H) thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition (ECR-PECVD). The elemental composition, growth rate, density, and refractive index values of the SiCN:H thin films were analyzed as functions of flow rates of pure acetylene (C2H2) and methane (CH4) hydrocarbon precursors. The …