Comparison of Stress Properties in SiOx, SiNx, and SiOxNy Thin Films Grown by Inductively Coupled Plasma CVD Academic Article uri icon

  •  
  • Overview
  •  
  • Identity
  •  
  • Additional Document Info
  •  
  • View All
  •  

abstract

  • Abstract not Available.

publication date

  • May 5, 2008