Characterization of Europium Doped Silicon Oxide, Silicon Oxynitride, and Silicon Nitride Films Prepared By Integrated Ecr-PECVD and Magnetron Sputtering Academic Article uri icon

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abstract

  • The compatibility of Si-based light sources with mainstream metal-oxide semiconductor technology has become very interesting over the past decades due to their potential in integrated optoelectronics circuits of monolithic Si [1]. A very promising approach to improve the light emission from silicon-based materials is doping silicon with rare earth elements, and numerous research is involved in this field [1]. However, there are only a few works on europium (Eu) doped silicon-based matrix. In this work, Eu doped silicon oxide, silicon oxynitride, and silicon nitride thin films were deposited on P (100) Si substrates using integrated electron cyclotron resonance plasma enhanced chemical vapor deposition (ECR-PECVD) and magnetron sputtering. Silane (SiH4), oxygen (O2), and Nitrogen(N2) gases were used as precursors and solid Eu as the sputtering target. The integrated ECR-PECVD and sputtering system allows tunable and highly consistent Eu doping concentration, better control of the layer stoichiometry along with less hydrogen incorporation in the deposited film compared to conventional CVD systems [2]. Several thin films were investigated using room temperature photoluminescence (PL) and X-ray diffraction (XRD). A detailed investigation of the effect of annealing on the PL was performed. The annealing temperature was varied from 500 OC to 1200 OC in nitrogen and a mixture of nitrogen and hydrogen atmospheres. It was observed that the intensity of the PL spectra increased with increasing annealing temperature. Besides, the hydrogen passivation effect has been studied in this work, which shows that hydrogen passivation increases the intensity of the peak. Based on the XRD measurements, we have found that the amorphous silicon oxide structure changes to a crystalline structure by adding nitrogen in the film. Interestingly silicon oxynitride and silicon nitride films do not show any luminescence at room temperature. The influence of the precursors' gases in the atomic percentage of the thin films was analyzed by Rutherford Backscattering spectrometry (RBS). In addition to it, the thickness and the index of refraction were characterized by variable angle spectroscopic ellipsometry (VASE). Reference: 1. Lin, Z., Huang, R., Wang, H., Wang, Y., Zhang, Y., Guo, Y., ... & Li, H. (2017). Dense nanosized europium silicate clusters induced light emission enhancement in Eu-doped silicon oxycarbide films. Journal of Alloys and Compounds, 694, 946-951. 2. Miller, J. W., Khatami, Z., Wojcik, J., Bradley, J. D. B., & Mascher, P. (2018). Integrated ECR-PECVD and magnetron sputtering system for rare-earth-doped Si-based materials. Surface and Coatings Technology, 336, 99-105.

publication date

  • May 1, 2020