Characterization of Europium Doped Silicon Oxide, Silicon Oxynitride, and Silicon Nitride Films Prepared By Integrated Ecr-PECVD and Magnetron Sputtering

The compatibility of Si-based light sources with mainstream metal-oxide semiconductor technology has become very interesting over the past decades due to their potential in integrated optoelectronics circuits of monolithic Si [1]. A very promising approach to improve the light emission from silicon-based materials is doping silicon with rare earth elements, and numerous research is involved in this field [1]. However, there are only a few works …