Journal article
(Invited) Universal Ion Implantation System for Use in the Preparation of Doped Silicon Dielectric Films
Authors
Knights AP; Savidge RM; Stevanovic DV; Kleiman RN; Chivers D
Journal
ECS Meeting Abstracts, Vol. MA2012-01, No. 19, pp. 827–827
Publisher
The Electrochemical Society
Publication Date
February 15, 2012
DOI
10.1149/ma2012-01/19/827
ISSN
2151-2043