Journal article
Reactive Ion Etching of Y2O3 Films Applying F-, Cl-and Cl/Br-Based Inductively Coupled Plasmas
Authors
Worhoff K; Bradley J; Ay F; Pollnau M
Journal
ECS Meeting Abstracts, Vol. MA2006-02, No. 29, pp. 1350–1350
Publisher
The Electrochemical Society
Publication Date
June 30, 2006
DOI
10.1149/ma2006-02/29/1350
ISSN
2151-2043