Demonstration of a ring-FEL as an EUV lithography tool Academic Article uri icon

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  • This paper presents the required structure and function of a ring-FEL as a radiation source for extreme ultraviolet radiation lithography (EUVL). A 100 m-long straight section that conducts an extremely low emittance beam from a fourth-generation storage ring can increase the average power at 13.5 nm wavelength to up to 1 kW without degrading the beam in the rest of the ring. Here, simulation results for a ring-FEL as a EUVL source are described.


  • Lee, Jaeyu
  • Jang, G
  • Kim, J
  • Oh, B
  • Kim, D-E
  • Lee, Sung-sik
  • Kim, J-H
  • Ko, J
  • Min, C
  • Shin, S

publication date

  • July 1, 2020