Nitrogen−implanted silicon. II. Electrical properties

This paper presents measurements of capacitance−voltage, Hall−effect, and diode characteristics on nitrogen−implanted silicon as a function of anneal temperature. The results of these three types of electrical measurements are consistent and show that less than 1% of the implanted nitrogen exhibits donor effects following anneals in the temperature range ∼700−900 °C. Hall−effect measurements performed as a function of temperature indicate that …