Journal article
Reactive Ion Etching of $Y_2O_3$ films applying F-, Cl and Cl/Br-based Inductively Coupled Plasmas
Authors
Bradley J; Ay F; Worhoff K; Pollnau M; Masscher P; Misra D
Journal
Synthese, Vol. 3, ,
DOI
10.1149/1.2392925
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