Journal article
Reactive Ion Etching of $Y_2O_3$ films applying F-, Cl and Cl/Br-based Inductively Coupled Plasmas
Authors
Bradley J; Ay F; Worhoff K; Pollnau M; Masscher P; Misra D
Journal
Synthese, Vol. 3, ,
Publication Date
October 20, 2006
DOI
10.1149/1.2392925