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Recent Advances in the Application of Slow...
Book

Recent Advances in the Application of Slow Positron Beams to the Study of Ion Implantation Defects in Silicon

Authors

Knights AP; Coleman PG

Volume

183-185

Pagination

pp. 41-52

Publisher

Trans Tech Publications

Publication Date

August 26, 2000

DOI

10.4028/www.scientific.net/ddf.183-185.41
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