Fabrication of low-loss channel waveguides in Al2O3 and Y2O3 layers by inductively coupled plasma reactive ion etching
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Overview
status
publication date
- November 2, 2007
has subject area
- 0205 Optical Physics (FoR)
- 0906 Electrical and Electronic Engineering (FoR)
- 0913 Mechanical Engineering (FoR)
- Optoelectronics & Photonics (Science Metrix)