Nanoporous polystyrene prepared via the selective removal of the low Mw component in polystyrene blends

Herein, we report a straightforward technique for the creation of nanoporous polystyrene (PS) films. By preparing PS blend samples with Mws of 600 000 and 600 g mol−1 followed by rinsing with n-heptane, the low Mw component was dissolved and removed to afford a low-density network of high Mw PS. Nanoscale pores are formed as a result of the miscibility and stability of the initial state. The resulting materials were characterized using …