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A technique for making alloy p-n junctions in InSb
Journal article

A technique for making alloy p-n junctions in InSb

Abstract

A radiation wetting technique coupled with a quasi equilibrium alloying procedure has been developed which gives uniform wetting and good junctions on indium antimonide at alloying temperatures as low as 200°C. The technique allows controlled formation of alloyed junctions of very low penetration such as would be required in the formation of alloy-diffused transistors in indium antimonide. The technique also permits the formation of flat …

Authors

Barber HD; Heasell EL

Journal

Solid-State Electronics, Vol. 8, No. 2, pp. 113–117

Publisher

Elsevier

Publication Date

February 1965

DOI

10.1016/0038-1101(65)90042-0

ISSN

0038-1101