Journal article
A technique for making alloy p-n junctions in InSb
Abstract
A radiation wetting technique coupled with a quasi equilibrium alloying procedure has been developed which gives uniform wetting and good junctions on indium antimonide at alloying temperatures as low as 200°C. The technique allows controlled formation of alloyed junctions of very low penetration such as would be required in the formation of alloy-diffused transistors in indium antimonide. The technique also permits the formation of flat …
Authors
Barber HD; Heasell EL
Journal
Solid-State Electronics, Vol. 8, No. 2, pp. 113–117
Publisher
Elsevier
Publication Date
February 1965
DOI
10.1016/0038-1101(65)90042-0
ISSN
0038-1101