The Redistribution of Gold during the Growth of an Oxide or of Phosphosilicate Glass on Contaminated Silicon Wafers

We have examined the redistribution between oxide, slice, and oxide surface of gold deposited from deliberately contaminated etching solutions onto silicon slices, during subsequent oxidation and phosphosilicate glass deposition. Results presented also show the distribution of gold throughout the oxide. The initial oxidizing or annealing conditions in the furnace are shown to have an important effect on the subsequent gold distribution.