Journal article
Influence of Deposition Conditions on the Characteristics of Luminescent Silicon Carbonitride Thin Films
Abstract
The influence of the substrate temperature and argon gas flow on the compositional, structural, optical, and light emission properties of amorphous hydrogenated silicon carbonitride (a-SiCxNy:H) thin films were studied. Thin films were fabricated using electron cyclotron resonance plasma enhanced chemical vapor deposition (ECR PECVD) at a range of substrate temperatures from 120 to 170°C (corresponding to deposition temperatures of 300 to …
Authors
Khatami Z; Bosco GBF; Wojcik J; Tessler LR; Mascher P
Journal
ECS Journal of Solid State Science and Technology, Vol. 7, No. 2, pp. n7–n14
Publisher
The Electrochemical Society
Publication Date
2018
DOI
10.1149/2.0151802jss
ISSN
2162-8769