authors
- Park, Min Sang
- Kim, Younggy
- Lee, Kyong Taek
- Kang, Chang Yong
- Min, Byoung-Gi
- Oh, Jungwoo
- Majhi, Prashant
- Tseng, Hsing-Huang
- Lee, Jack C
- Banerjee, Sanjay K
- Lee, Jeong-Soo
- Jammy, Raj
- Jeong, Yoon-Ha
Reliability study of methods to suppress boron transient enhanced diffusion in high-k/metal gate Si/SiGe channel pMOSFETs
Journal Articles
- Overview
- Research
- Identity
- Additional Document Info
- View All
Overview
status
publication date
- December 2013
has subject area
- 0204 Condensed Matter Physics (FoR)
- 0299 Other Physical Sciences (FoR)
- 0906 Electrical and Electronic Engineering (FoR)
- Applied Physics (Science Metrix)
published in
- Microelectronic Engineering Journal