Reliability study of methods to suppress boron transient enhanced diffusion in high-k/metal gate Si/SiGe channel pMOSFETs Academic Article uri icon

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authors

  • Park, Min Sang
  • Kim, Younggy
  • Lee, Kyong Taek
  • Kang, Chang Yong
  • Min, Byoung-Gi
  • Oh, Jungwoo
  • Majhi, Prashant
  • Tseng, Hsing-Huang
  • Lee, Jack C
  • Banerjee, Sanjay K
  • Lee, Jeong-Soo
  • Jammy, Raj
  • Jeong, Yoon-Ha

publication date

  • December 2013