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ZnO field-effect transistors prepared by aqueous...
Journal article

ZnO field-effect transistors prepared by aqueous solution-growth ZnO crystal thin film

Abstract

A ZnO thin-film transistor (TFT) with a channel layer formed via aqueous solution-growth at low temperature is demonstrated. This ZnO thin-film semiconductor has a well-controlled crystalline form, exhibiting n-channel, enhancement-mode behavior with a channel mobility as large as 0.56 cm2 V−1 s−1. Low-cost, superior transistor characteristics and low-temperature processing makes ZnO TFT attractive for flexible electronics on temperature sensitive substrates.

Authors

Li C; Li Y; Wu Y; Ong BS; Loutfy RO

Journal

Journal of Applied Physics, Vol. 102, No. 7,

Publisher

AIP Publishing

Publication Date

October 1, 2007

DOI

10.1063/1.2773683

ISSN

0021-8979

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