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Modelling of InGaP nanowires morphology and...
Journal article

Modelling of InGaP nanowires morphology and composition on molecular beam epitaxy growth conditions

Abstract

An analytical kinetic model has been developed within this framework to describe the growth of ternary III-V semiconductor nanowires. The key to apply the model is to divide the ternary system into two separate binary systems and model each binary system separately. The model is used to describe the growth of InGaP nanowires. The growth conditions were varied among several samples, and the model was able to predict the temperature and growth …

Authors

Fakhr A; Haddara YM

Journal

Journal of Applied Physics, Vol. 116, No. 2,

Publisher

AIP Publishing

Publication Date

July 14, 2014

DOI

10.1063/1.4889801

ISSN

0021-8979