Journal article
Metal–insulator–semiconductor tunneling microscope: two-dimensional dopant profiling of semiconductors with conducting atomic-force microscopy
Abstract
A method for two-dimensional carrier profiling is presented, based on tunneling from a conducting atomic-force microscope (AFM) probe tip to a semiconductor sample. Current–voltage data are taken during the AFM scan on a cross-sectioned sample consisting of epitaxial InP multilayers. The results show a clear dependence of the current–voltage characteristics on the carrier concentration and different behavior for n-and p-type InP. Modeling of …
Authors
Richter S; Geva M; Garno JP; Kleiman RN
Journal
Applied Physics Letters, Vol. 77, No. 3, pp. 456–458
Publisher
AIP Publishing
Publication Date
July 17, 2000
DOI
10.1063/1.127008
ISSN
0003-6951