Experts has a new look! Let us know what you think of the updates.

Provide feedback
Home
Scholarly Works
The Manipulation and Alignment of Silicon Carbide...
Journal article

The Manipulation and Alignment of Silicon Carbide Whiskers for Gallium Nitride Epitaxial Growth

Abstract

As a substrate candidate for low‐cost III ‐nitride thin film growth, 3 C – SiC whiskers are employed and manipulated in this work. The alignment of the whiskers is achieved on a patterned 3M Vikuiti ™ Brightness Enhancement Film surface. The degree of whisker alignment using this approach is higher than the whiskers lined up by extrusion methods according to X ‐ray diffraction ( XRD ) analysis. The aligned whiskers are transferred from the …

Authors

Shen H; Li B; Yu LH; Kitai A

Journal

Journal of the American Ceramic Society, Vol. 97, No. 10, pp. 3077–3086

Publisher

Wiley

Publication Date

10 2014

DOI

10.1111/jace.13090

ISSN

0002-7820

Labels