Block Copolymer Nanostructures for Technology Journal Articles

abstract

• Nanostructures generated from block copolymer self-assembly enable a variety of potential technological applications. In this article we review recent work and the current status of two major emerging applications of block copolymer (BCP) nanostructures: lithography for microelectronics and photovoltaics. We review the progress in BCP lithography in relation to the requirements of the semiconductor technology roadmap. For photovoltaic applications, we review the current status of the quest to generate ideal nanostructures using BCPs and directions for future research.

authors

• Tseng, Yu-Chih
• Darling, Seth B

publication date

• December 2010

has subject area

• 03 Chemical Sciences (FoR)
• 09 Engineering (FoR)

published in

• Polymers  Journal

keywords

• ARRAYS
• CHARGE-TRANSPORT
• DENSITY MULTIPLICATION
• DONOR
• FABRICATION
• IMMERSION LITHOGRAPHY
• LINE-EDGE ROUGHNESS
• PATTERNS
• POLY(FERROCENYLSILANES)
• Physical Sciences
• Polymer Science
• Science & Technology
• THIN-FILMS
• block copolymer
• lithography
• photovoltaics

Digital Object Identifier (DOI)

• 10.3390/polym2040470

start page

• 470

end page

• 489

volume

• 2

issue

• 4