Journal article
Block Copolymer Nanostructures for Technology
Abstract
Nanostructures generated from block copolymer self-assembly enable a variety of potential technological applications. In this article we review recent work and the current status of two major emerging applications of block copolymer (BCP) nanostructures: lithography for microelectronics and photovoltaics. We review the progress in BCP lithography in relation to the requirements of the semiconductor technology roadmap. For photovoltaic …
Authors
Tseng Y-C; Darling SB
Journal
Polymers, Vol. 2, No. 4, pp. 470–489
Publisher
MDPI
DOI
10.3390/polym2040470
ISSN
2073-4360