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Strain relaxation in (100) and (311) GaP∕GaAs thin...
Journal article

Strain relaxation in (100) and (311) GaP∕GaAs thin films

Abstract

The nature of strain relaxation in GaP films grown on (100), (311)A, and (311)B GaAs by molecular beam epitaxy has been studied by transmission electron microscopy and atomic force microscopy. It is found that (100) GaP∕GaAs films develop surface undulations with twinning and cracking. (311)A GaAs provides good growth orientation for GaP films, producing flat surfaces and crack-free films. Similarly, (311)B GaP∕GaAs films do not develop cracks, …

Authors

Li Y; Niewczas M

Journal

Journal of Applied Physics, Vol. 101, No. 6,

Publisher

AIP Publishing

Publication Date

March 15, 2007

DOI

10.1063/1.2709615

ISSN

0021-8979