Effects of gate dielectric surface modification on phototransistors with polymer-blended benzothieno[2,3-b]benzothiophene semiconductor thin films

In the present work, we investigated effects of the dielectric/semiconductor interface modification on the photoelectrical properties of phototransistors comprising a UV responsive semiconductor blend 2,7-dipentyl-[1]benzothieno[2,3-b][1]benzothiophene (C5-BTBT) and a linear unsaturated polyester (L-upe). Using various self-assembly monolayers with different end-groups at the dielectric/semiconductor interface we modulated the drain photocurrent and response times under the UV light illumination of phototransistors. Treatment of the SiO2 dielectric surface with organosilanes led to the variation of the max mobility in the dark 0.10–0.18 cm2 V−1 s−1 and under UV light 0.08–0.50 cm2 V−1 s−1. Interestingly, detailed crystal structure analysis using 2D X-ray diffraction and photoelectrical characterization revealed that mobility in the dark predominantly depends on the alignment of C5-BTBT crystallites at the interface. Under UV light, the mobility increased with the electron withdrawing/donating nature of the SAM end-functional group. Additionally, chemical modification of the SiO2 dielectric surface increased photocurrent relaxation/decay times upon UV light removal while retaining fast response times when exposed to UV light, which enhanced memory properties of fabricated phototransistors (fast UV response = writing and long relaxation = long data storage).