Manganese deposition without additives

A new method was developed to deposit high quality manganese coatings from MnSO4 aqueous solution without any additives (sulphur or selenium compounds). The method was by pre-electrolysis of the plating bath. Thereafter, the plating of manganese proceeded. High cathode current efficiency (71%) was obtained. Studies showed that deposition time and current density influence the current efficiency of manganese deposition.